Leni, Rumiyanti and Erika, Sempana Br Ginting and Ihwanul, Aziz and Simon, Sembiring and Warsito, Warsito The Deposition of Silver (Ag) On a Glass Substrate (SiO2) Using Direct Current Sputtering Method. IOP Conference Series: Materials Science and Engineering. ISSN 1757-899X (Unpublished)

[img] Text

Download (612kB)


The research's aims are to calculate the absorbance and the thickness value of the silver (Ag) thin layer formed on the glass substrate (SiO2) at various visible wavelengths. The silver (Ag) thin layer was formed using Direct Current Sputtering method. The research showed that the highest absorbance value on the glass (SiO2) substrate was 4.000 with wavelengths 287.50 nm. While, the lowest absorbance value on the glass (SiO2) substrate was -4.000 with wavelengths 262.50 nm and 243 nm. The lowest absorbance value is estimated because of the part of the substrate that has not been completely coated so that the part is not absorbed at all. Using Swanepoel equation we obtained the thickness value of the thin layer equal to 4.692663316 nm with sputtering time of 15 minutes. Keywords: Direct Current Sputtering, thin layer, silver

Item Type: Article
Subjects: Q Science > QC Physics
Divisions: Fakultas Matematika dan Ilmu Pengetahuan Alam (FMIPA) > Prodi Fisika
Depositing User: LENI RUMIY
Date Deposited: 16 Nov 2018 17:24
Last Modified: 16 Nov 2018 17:24
URI: http://repository.lppm.unila.ac.id/id/eprint/10105

Actions (login required)

View Item View Item